South Bay Technology, Inc. Model PE2000 Plasma Etcher

MODEL PE2000 - Plasma Etcher

The PE 2000 RF Plasma Etcher is specifically designed for reactive gas plasma etching and surface treatments. The unit is capable of 150 watts RF forward power at 13.56 MHz and up to four gas processing. The system is ideal for R&D applications where single sample processing is needed and total control of each process parameter is necessary. Processes such as photoresist strip, BPSG removal, oxide and nitride layer etch, surface treatment of plastics and plasma cleaning are typical applications. Samples up to 6" diameter as well as irregular shaped substrates can be accommodated in the 200mm diameter vacuum chamber. A fully manual control system coupled with digital readouts and integral matching network with switching type power generator offer a wide range of experimental etch parameters.
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Optional Accessories	Model # / Part #	Price	Enter Qty.
Stainless Steel Chamber with Viewport, in place of Quartz Chamber	PE2000-003/02-80171-01		Qty.
Chamber Gasket (2 required per unit) for Quartz Chamber only	BJG8/0570-008		Qty.
Quartz Chamber (8" diameter x 5" high)	PE2000-001/02-80169-01		Qty.
RF Shield for Quartz Chamber	PE2000-002/02-80170-01		Qty.

South Bay Technology is no longer accepting web site orders. On October 4th, 2017 Ted Pella, Inc. purchased the products of South Bay Technology. Ted Pella, Inc. is in the process of evaluating and transitioning the products of SBT, which will happen over a period of the next several months. Please contact [email protected] for inquiries as to the status of products you wish to order.